WebJun 2, 1993 · Our proposed method to calculate the surface SiOx thin-film stoichiometry is easy to use, because it needs two XPS measurements only, and it does not require … WebMay 5, 2004 · The XPS analysis performed on the uncoated material are presented in Fig. 5. The data are summarized in Table II . The peak fitting for Ni contribution has been performed using two pairs of peaks as shown in Fig. 5 a (854.88 and 857.37 eV, respectively), otherwise with only one contribution the peak fitting leads to large fwhm, …
X-ray photoelectron spectroscopy: Towards reliable binding …
WebApr 29, 2016 · The silicon oxide nano-powders (SiOx-NPs) were obtained in an atmospheric microwave plasma torch using a gas-phase silicon tetrachloride (SiCl4) with N2 and H2. ... The sample was analyzed by an X-ray photoelectron spectroscopy (XPS), a scanning electron microscope (SEM), an energy dispersive spectrometer (EDS), and an X-ray … WebAbstract The surface stoichiometry of SiOx thin films (x = 1,…, 2) has been determined by means of x-ray photoelectron spectroscopy using: (a) two well established methods … government contract task orders
(PDF) XPS studies on SiOx thin films - ResearchGate
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